DocumentCode :
2451994
Title :
Aspects of temperature dependence on Au-Ti/GaAs(SI) Schottky barrier
Author :
Negrila, C.C. ; Ungureanu, F. ; Ghita, R.V.
Author_Institution :
Nat. Inst. of Mater. Phys., Bucharest, Romania
Volume :
2
fYear :
2009
fDate :
12-14 Oct. 2009
Firstpage :
455
Lastpage :
458
Abstract :
Fabrication of Au-Ti Schottky structure on GaAs semi-insulating wafer was related to an ultra-high vacuum deposition condition and low vacuum annealing in low vacuum and temperature range T=320-360degC. There are presented representative I-V characteristics in dark and in different light (power levels). The spectral response has a maximum in Deltalambda= (850-950) nm corresponding to a band-to-band transition. The complex dependence of optical generated non-equilibrium carriers is related to the equivalent state density at the conduction band edge (in T3/2 factor) and in exponential distribution factor exp (-(E-F)/kT).
Keywords :
III-V semiconductors; Schottky barriers; annealing; conduction bands; gallium arsenide; gold alloys; materials preparation; titanium alloys; vacuum deposition; -V characteristics; AuTi-GaAs; GaAs; Schottky barrier; Schottky structure fabrication; conduction band; exponential distribution factor; optical generated nonequilibrium carriers; semiinsulating wafer; temperature 320 C to 360 C; temperature dependence; ultrahigh vacuum deposition; vacuum annealing; wavelength 850 nm to 950 nm; Annealing; Gallium arsenide; Gold; Ohmic contacts; Schottky barriers; Sputtering; Substrates; Temperature dependence; Temperature distribution; Titanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 2009. CAS 2009. International
Conference_Location :
Sinaia
ISSN :
1545-827X
Print_ISBN :
978-1-4244-4413-7
Type :
conf
DOI :
10.1109/SMICND.2009.5336680
Filename :
5336680
Link To Document :
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