Title :
Semiconductor opening switch research at IEP
Author :
Mesyats, G.A. ; Rukin, S.N. ; Lyubutin, S.K. ; Darznek, S.A. ; Litvinov, Ye.A. ; Telnov, V.A. ; Tsiranov, S.N. ; Turov, A.M.
Author_Institution :
Inst. of Electrophys., Acad. of Sci., Ekaterinburg, Russia
Abstract :
This paper describes the physical principles of operation of semiconductor opening switches (SOS). The SOS effect occurs at a current density of up to 60 kA/cm/sup 2/ in silicon p/sup +/-p-n-n/sup +/ structures filled with residual electron-hole plasma with the concentration between 10/sup 16/ and 10/sup 17/ cm/sup -3/. On the basis of a theoretical model developed for plasma dynamic calculation the mechanism by which the current passes through the structure at the stage of high conduction and the processes that occur at the stage of current interruption have been investigated. Dynamics of the electron-hole plasma were calculated with allowance for real distribution of impurity doping in the structures. Experimentally obtained current density-time, and current density-interruption time dependencies of semiconductor opening switches are discussed. Applications of the SOS effect in pulsed power is also be demonstrated.
Keywords :
current density; impurities; p-n junctions; power semiconductor switches; pulsed power switches; semiconductor doping; semiconductor plasma; Institute of Electrophysics; Si; current density; current density-interruption time dependency; current density-time dependency; current interruption; electron-hole plasma dynamics; high conduction; impurity doping distribution; operation principles; plasma dynamic calculation; pulsed power; residual electron-hole plasma; semiconductor opening switch; silicon p/sup +/-p-n-n/sup +/ structures; Capacitors; Current density; Plasma applications; Plasma density; Semiconductor diodes; Solid state circuits; Switches; Switching circuits; Voltage; Wires;
Conference_Titel :
Pulsed Power Conference, 1995. Digest of Technical Papers., Tenth IEEE International
Conference_Location :
Albuquerque, NM, USA
Print_ISBN :
0-7803-2791-8
DOI :
10.1109/PPC.1995.596496