DocumentCode :
2455346
Title :
FDSOI CMOS with dual backgate control for performance and power modulation
Author :
Yau, Jeng-Bang ; Cai, Jin ; Shi, Leathen ; Dennard, Robert H. ; Kumar, Arvind ; Sactlger, K.L. ; Reznicek, Alexander ; Solomon, Paul M. ; Ouyang, Qiqingg ; Koester, Steven ; Haensch, W.E.
Author_Institution :
IBM Semicond. R&D Center, IBM T.J. Watson Res. Center, Yorktown Heights, NY, USA
fYear :
2009
fDate :
27-29 April 2009
Firstpage :
84
Lastpage :
85
Abstract :
We demonstrate, for the first time, modulation of power-performance of a ring oscillator fabricated on thin-BOX (buried oxide) FD (fully-depleted) SOI using independent backgate controls for nFET and pFET. The thin BOX facilitates an effective modulation of ring characteristics with small (1-2V) independent backgate voltages. Leakage current per stage can be reduced by more than 100times with 30% increase of inverter delay. In addition, the inverter delay can be improved by 15% with 2times increase of the stand-by current. Compatible with conventional CMOS process, our results suggest the backgate technology, an additional knob for power/performance optimization and variability control, is attractive for continued CMOS scaling.
Keywords :
CMOS integrated circuits; field effect transistors; oscillators; silicon-on-insulator; FDSOI CMOS; backgate voltages; buried oxide fully-depleted SOI; dual backgate control; leakage current; nFET; pFET; power modulation; ring oscillator; thin-BOX FD SOI; Added delay; CMOS process; CMOS technology; Inverters; Leakage current; Optimization; Ring oscillators; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems, and Applications, 2009. VLSI-TSA '09. International Symposium on
Conference_Location :
Hsinchu
ISSN :
1524-766X
Print_ISBN :
978-1-4244-2784-0
Electronic_ISBN :
1524-766X
Type :
conf
DOI :
10.1109/VTSA.2009.5159302
Filename :
5159302
Link To Document :
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