Title :
Status and challenges of extreme-UV lithography
Author :
Ronse, Kurt ; Hendrickx, Eric ; Goethals, Mieke ; Jonckheere, Rik ; Vandenberghe, Geert
Author_Institution :
IMEC, Leuven, Belgium
Abstract :
In this paper, the experiences on full field EUVL lithography are reviewed. Besides the imaging performance of the EUV ADT at IMEC, also the progress in resists and reticles are discussed and compared to the production requirements for EUV lithography.
Keywords :
resists; reticles; ultraviolet lithography; extreme-ultraviolet lithography; resists; reticles; Focusing; Inspection; Lithography; Manufacturing; Optical imaging; Position measurement; Printing; Protection; Resists; Ultraviolet sources;
Conference_Titel :
VLSI Technology, Systems, and Applications, 2009. VLSI-TSA '09. International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4244-2784-0
Electronic_ISBN :
1524-766X
DOI :
10.1109/VTSA.2009.5159309
