DocumentCode
2457251
Title
Simulation of Atomic Force Microscopy (AFM) with applications to image analysis and control design
Author
Belikov, Sergey
Author_Institution
MikroMasch USA
fYear
2009
fDate
10-12 June 2009
Firstpage
30
Lastpage
30
Abstract
Control of experiment is essential part of Atomic Force Microscopy (AFM). AFM is the technique in which is a minute probe is applied for high-resolution profiling of samples and studies of their mechanical and electric properties at the nanometer scale. The importance of this technique is increasing with miniaturization of functional industrial components and related need in comprehensive material characterization at small dimensions. In recent years control systems community expressed significant interest to AFM (several invited sessions at ACC 2008 and ACC 2009, publications in Control Systems Magazine). Further development of this method, which is related to transition to multi-frequency and broad band measurements and use increasing number of lock-in amplified, is inconceivable with proper advances in design and control of AFM instrumentation and applications. With increasing role of nanotechnology, AFM becomes an important tool in control education and research. However, few control experts have access to expensive AFM instrumentation. AFM Simulator allows control experts to demonstrate applicability of their theories and algorithms to AFM. This will increase the needed flow of ideas from control community to AFM instrument designers and practitioners. Simulator can be also introduced into control curriculums to expand them towards nanotechnology applications. All this shows the importance of this special session that will attract the control scientists and specialists to this valuable practical field.
Keywords
Analytical models; Atomic force microscopy; Control design; Control systems; Force control; Image analysis; Instruments; Mechanical factors; Nanotechnology; Probes;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference, 2009. ACC '09.
Conference_Location
St. Louis, MO, USA
ISSN
0743-1619
Print_ISBN
978-1-4244-4523-3
Electronic_ISBN
0743-1619
Type
conf
DOI
10.1109/ACC.2009.5159788
Filename
5159788
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