DocumentCode :
2460491
Title :
Progress in the measurement of lattice spacing d
Author :
Nakayama, K. ; Fujimoto, H.
Author_Institution :
Nat. Res. Lab. of Metrol., Ibaraki, Japan
fYear :
1996
fDate :
17-21 June 1996
Firstpage :
470
Lastpage :
471
Abstract :
Experiments on the lattice spacing measurement have been performed with an improved X-ray and optical interferometer (XROI). Previously reported standard deviation of 0.16 ppm has been reduced to 0.04 ppm. A new value of silicon lattice spacing is reported.
Keywords :
X-ray crystallography; X-ray imaging; constants; crystal structure; elemental semiconductors; light interferometry; measurement errors; silicon; Avogadro constant; Si; X-ray interferometry; X-ray optics; lattice spacing; optical interferometry; standard deviation; Interference; Laser beams; Lattices; Optical distortion; Optical feedback; Optical interferometry; Optical retarders; Optical sensors; Silicon; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Precision Electromagnetic Measurements Digest, 1996 Conference on
Conference_Location :
Braunschweig, Germany
Print_ISBN :
0-7803-3376-4
Type :
conf
DOI :
10.1109/CPEM.1996.547170
Filename :
547170
Link To Document :
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