The calculations of surface structures of the thin film being applied by method of ionic condensation

Author

Kostyuk, G.I. ; Levchenko, L.G.

Author_Institution

Kharkov Aviation Inst., Ukraine

Volume

2

fYear

1998

fDate

17-21 Aug 1998

Firstpage

585

Abstract

Precomputations have demonstrated the basic opportunity of plasma oscillations use for film surface relief creation at the stage of condensation that presents practical interest in connection with the unusual opportunities of the given method. Besides the use of nonstationary plasma oscillations (and also of voltage frequencies) doubtless opens series a additional opportunities. It is necessary to note that the calculations of condensation in the structures of complex forms may be produced; in this case, the drift of frequencies is the main control parameter

Keywords

condensation; plasma deposited coatings; plasma deposition; plasma oscillations; surface structure; surface topography; thin films; complex form structures; film surface relief creation; frequencies drift; ionic condensation method; nonstationary plasma oscillations; plasma oscillations; thin film deposition; voltage frequencies; Absorption; Art; Equations; Ion beams; Mathematical model; Plasmas; Substrates; Surface structures; Transistors; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on

Conference_Location

Eindhoven

ISSN

1093-2941

Print_ISBN

0-7803-3953-3

Type

conf

DOI

10.1109/DEIV.1998.738733

Filename

738733