DocumentCode
2463508
Title
Design issues in gas cluster ion beamlines
Author
Becker, R. ; Gwinn, M. ; Swenson, D.R. ; Torti, R.P. ; Roby, R.
fYear
2002
fDate
27-27 Sept. 2002
Firstpage
665
Lastpage
668
Abstract
The design of gas cluster ion beam (GCIB) equipment is complicated by a number of issues unique to such beams. Ion charge and mass are typically not known but instead follow rather broad distributions. Space charge becomes important at much lower current levels than in implant equipment due to the very high mass of the ions. The beam, itself, transports a significant amount of gas and this gas load must be taken into account in the design. The novel issues of GCIB are discussed here and solutions are presented.
Keywords
beam handling equipment; ion beams; ion implantation; ionised cluster beam deposition; semiconductor doping; space charge; design issues; gas cluster ion beamlines; ion charge; ion mass; space charge; Atomic beams; Gases; Implants; Ion beams; Ion implantation; Rough surfaces; Smoothing methods; Space charge; Sputter etching; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location
Taos, New Mexico, USA
Print_ISBN
0-7803-7155-0
Type
conf
DOI
10.1109/IIT.2002.1258093
Filename
1258093
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