DocumentCode :
2464200
Title :
Spin valve device with sub-half micron core width fabricated by reactive etching
Author :
Iijima, M. ; Kishi, H. ; Tanaka, A. ; Kamata, C. ; Eguchi, S.
Author_Institution :
Fujitsu Ltd.
fYear :
2000
fDate :
9-13 April 2000
Firstpage :
394
Lastpage :
394
Keywords :
Electromagnetic devices; Fabrication; Laboratories; Magnetic cores; Magnetic semiconductors; Plasma applications; Plasma devices; Spin valves; Sputter etching; Sulfur hexafluoride;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2000. INTERMAG 2000 Digest of Technical Papers. 2000 IEEE International
Conference_Location :
Toronto, ON, Canada
Print_ISBN :
0-7803-5943-7
Type :
conf
DOI :
10.1109/INTMAG.2000.872169
Filename :
872169
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2464200
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