Nanosecond high current and high repetition rate electron source

Author

Gushenets, V.I. ; Koval, N.N. ; Schanin, P.M. ; Tolkachev, V.S.

Author_Institution

High Current Electron. Inst., Tomsk, Russia

Volume

2

fYear

1998

fDate

17-21 Aug 1998

Firstpage

649

Abstract

A broad electron beam source with a plasma hollow cathode has been developed which is intended for the production of nanosecond electron beams with a high repetition rate. The source lifetime is over 10⁹ shots. To reduce the operating pressure and shorten the time required for the formation of plasma in the cathode cavity, an auxiliary triggering glow discharge with a hollow cathode is used. With an accelerating voltage of 40 keV, a pulse repetition rate of 50-1000 Hz, and a pulse duration of 100 ns, an electron beam of current up to 200 A and risetime 25 ns has been produced

Keywords

cathodes; electron beams; glow discharges; plasma devices; power supplies to apparatus; pulse generators; pulsed power technology; 100 ns; 200 A; 25 ns; 40 keV; 50 to 1000 Hz; accelerating voltage; auxiliary triggering glow discharge; broad electron beam source; cathode cavity; nanosecond electron beam production; operating pressure; plasma formation time; plasma hollow cathode; pulse duration; pulse repetition rate; pulsed power; source lifetime; Acceleration; Cathodes; Electrodes; Electron beams; Electron sources; Fault location; Glow discharges; Plasma accelerators; Plasma sources; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on

Conference_Location

Eindhoven

ISSN

1093-2941

Print_ISBN

0-7803-3953-3

Type

conf

DOI

10.1109/DEIV.1998.738831

Filename

738831