DocumentCode :
2465699
Title :
New opportunities in vacuum electronics through the application of microfabrication technologies
Author :
Booske, John H.
Author_Institution :
Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
fYear :
2002
fDate :
2002
Firstpage :
11
Lastpage :
12
Abstract :
Recent developments in microfabrication technologies have produced a portfolio of methods to batch fabricate three-dimensional, micro-scale structures. This has opened the door to new and exciting possibilities in vacuum electronics technology. Application of these modern microfabrication techniques to vacuum electronics now offers new prospects, including: (1) improved device efficiency by replacing thermionic cathodes with micro-fabricated field emitter cathodes, (2) reliable, precise fabrication of miniature millimeter and submillimeter wave circuits, (3) high yields and lower component costs due to batch fabrication, and (4) greater integration which can reduce piece parts assembly, increase yields, and decrease costs.
Keywords :
vacuum microelectronics; batch fabrication; field emitter cathode; microfabrication technology; millimeter wave circuit; submillimeter wave circuit; three-dimensional structure; vacuum electronics; Cathodes; Costs; Fabrication; Integrated circuit reliability; Millimeter wave devices; Millimeter wave technology; Portfolios; Submillimeter wave circuits; Submillimeter wave technology; Vacuum technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electronics Conference, 2002. IVEC 2002. Third IEEE International
Print_ISBN :
0-7803-7256-5
Type :
conf
DOI :
10.1109/IVELEC.2002.999234
Filename :
999234
Link To Document :
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