Evolution of barrier properties in magnetic tunnel junctions by annealing
Author :
Schmalhorst, J. ; Thomas, A. ; Justus, M. ; Reiss, G. ; Bruckl, H. ; Vieth, M. ; Gieres, G. ; Wecker, J.
Author_Institution :
University of Bielefeld
fYear :
2000
fDate :
9-13 April 2000
Firstpage :
507
Lastpage :
507
Keywords :
Annealing; Atomic force microscopy; Electrical resistance measurement; Electrons; Magnetic field measurement; Magnetic properties; Magnetic tunneling; Plasma temperature; Saturation magnetization; Tunneling magnetoresistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2000. INTERMAG 2000 Digest of Technical Papers. 2000 IEEE International
