Title :
ESD device simulation in a pre-Si phase
Author :
Li, Zhiguo ; Yue, Suge
Author_Institution :
Beijing Microelectron. Technol. Inst., Beijing
Abstract :
In this paper, a novel approach that performs device simulation in the pre-Si phase to evaluate the robustness of the ESD protection device is presented. Several key parameters, such as the spacing from gate to source contact, the spacing from gate to drain contact, the length of the gate and the width of the gate are researched using the simulator MEDICI. Tunneling phenomenon is also observed and expatiated in ESD protection device. An empirical equation is derived based on the simulation to calculate the failure threshold of the device. The prediction of ESD protection circuit performance in early design phase shortens the design cycle and reduces the cost.
Keywords :
CMOS integrated circuits; electric breakdown; electrical contacts; electrostatic discharge; protection; tunnelling; CMOS technology; ESD device simulation; ESD protection device; NMOS; failure threshold; gate length; gate width; gate-drain contact spacing; gate-source contact spacing; tunneling phenomenon; Circuit optimization; Circuit simulation; Costs; Electrostatic discharge; Equations; Medical simulation; Performance evaluation; Protection; Robustness; Tunneling; Breakdown; ESD; MEDICI; Simulation;
Conference_Titel :
Electron Devices and Solid-State Circuits, 2008. EDSSC 2008. IEEE International Conference on
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-2539-6
Electronic_ISBN :
978-1-4244-2540-2
DOI :
10.1109/EDSSC.2008.4760700