DocumentCode
2469755
Title
Improvement of accuracy and speed of a commercial AFM using positive position feedback control
Author
Mahmood, I.A. ; Moheimani, S.O.R.
Author_Institution
Sch. of Electr. Eng. & Comput. Sci., Univ. of Newcastle, Callaghan, NSW, Australia
fYear
2009
fDate
10-12 June 2009
Firstpage
973
Lastpage
978
Abstract
The atomic force microscope (AFM) is a device capable of generating topographic images of sample surfaces with extremely high resolutions down to the atomic level. It is also being used in applications that involve manipulation of matter at a nanoscale. Early AFMs were operated in open loop. As a result, they were susceptible to piezoelectric creep, thermal drift, hysteresis nonlinearity and scan-induced vibration. These effects tend to distort the generated image. The distortions are often minimized by limiting the scanning speed and range of the AFMs. Recently a new generation of AFMs has emerged that utilizes position sensors to measure displacements of the scanner in three dimensions. These AFMs are equipped with feedback loops that work to minimize the adverse effects of hysteresis, piezoelectric creep and thermal drift on the obtained image using standard PI controllers. These feedback controllers are often not designed to deal with the highly resonant nature of an AFM´s scanner, nor with the cross-coupling between various axes. In this paper we illustrate the drastic improvement in accuracy and imaging speed that can be obtained by proper design of a feedback controller. Such controllers can be incorporated into most modern AFMs with minimal effort since they can be implemented in software with the existing hardware.
Keywords
PI control; atomic force microscopy; control system synthesis; feedback; position control; atomic force microscope; feedback controllers design; feedback loops; hysteresis nonlinearity; open loop; piezoelectric creep; position sensors; positive position feedback control; scan-induced vibration; standard PI controllers; thermal drift; topographic images; Adaptive control; Atomic force microscopy; Creep; Distortion measurement; Feedback control; Force control; Hysteresis; Image generation; Image resolution; Surface topography;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference, 2009. ACC '09.
Conference_Location
St. Louis, MO
ISSN
0743-1619
Print_ISBN
978-1-4244-4523-3
Electronic_ISBN
0743-1619
Type
conf
DOI
10.1109/ACC.2009.5160335
Filename
5160335
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