DocumentCode :
2470415
Title :
Sputtering Dose Control of Ion Mill Processing
Author :
Raschke, Curt ; Wilde, Patrick ; Hill, Cynthia
fYear :
1987
fDate :
14-16 Oct. 1987
Firstpage :
193
Lastpage :
196
Keywords :
Computerized monitoring; Fabrication; Gratings; Ion beams; Milling machines; Optical films; Proportional control; Sputter etching; Sputtering; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
IEEE 1987 Ultrasonics Symposium
Conference_Location :
Denver, Colorado, USA
Type :
conf
DOI :
10.1109/ULTSYM.1987.198952
Filename :
1535892
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2470415
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