Title :
Q-factor tuning in all-active whispering-gallery mode resonators with Si-nc
Author :
Pitanti, A. ; Ghulinyan, M. ; Xie, M. ; Pucker, G. ; Pavesi, L.
Author_Institution :
Dipt. di Fis., Univ. degli studi di Trento, Povo, Italy
Abstract :
Q-factor tuning in stress-engineered microresonators is presented. Bent-edge microdisks (mu-kylix), where highest Q´s are 60 nm blue-shifted with respect to flat disks, are used to probe Purcell enhancement of Si-nc emission rate in a wide spectral range.
Keywords :
Q-factor; elemental semiconductors; integrated optics; micro-optics; microcavities; micromechanical resonators; nanostructured materials; optical resonators; optical tuning; photoluminescence; silicon; spectral line shift; spontaneous emission; whispering gallery modes; Purcell enhancement; Q-factor tuning; Si; all-active whispering-gallery mode resonators; bent-edge microdisks; blue-shift; flat disks; microphotoluminescence; silicon nanocrystal; spontaneous emission rate; stress-engineered microresonators; Dielectric materials; III-V semiconductor materials; Laser tuning; Microcavities; Optical losses; Optical materials; Optical resonators; Optical scattering; Q factor; Whispering gallery modes;
Conference_Titel :
Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4244-4402-1
Electronic_ISBN :
1949-2081
DOI :
10.1109/GROUP4.2009.5338298
