Ion Implantation Characterisation: A Comparison of Photothermal Radiometric and Photodisplacement Thermal Wave Techniques

Author

Crean, G.M. ; Sheard, S.J. ; See, C.W. ; Somekh, M.G.

fYear

1987

fDate

14-16 Oct. 1987

Firstpage

597

Lastpage

600

Keywords

Boron; Fabrication; Implants; Ion implantation; Microscopy; Monitoring; Process control; Radiometry; Silicon; Very large scale integration;

fLanguage

English

Publisher

ieee

Conference_Titel

IEEE 1987 Ultrasonics Symposium

Conference_Location

Denver, Colorado, USA

Type

DOI

10.1109/ULTSYM.1987.199027

Filename

1535967

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