DocumentCode :
2472217
Title :
/spl mu/transparent insulating channels as components for miniaturized chemical separation devices
Author :
Schasfoort, R.B.M. ; Hendrikse, J. ; van den Berg, A.
Author_Institution :
MESA Res. Inst., Twente Univ., Enschede, Netherlands
fYear :
2000
fDate :
11-13 July 2000
Firstpage :
20
Lastpage :
24
Abstract :
Currently, miniaturized devices that apply electro osmotic pumping or electrophoretic separations are mostly constructed by etching small insulating channels for supply and separation on glass substrates. In principle, silicon is a superior construction material in terms of inertness and design flexibility. However, because of its semiconducting properties, the use in high voltage applications like the ones mentioned above is quite limited. In this paper, the use of /spl mu/Transparent Insulating Channel (/spl mu/TIC) technology is demonstrated as a standard procedure to manufacture miniaturized analytical separation devices. This technique, /spl mu/channels having extremely thin, transparent and insulating walls can be fabricated. An overview of the impact of this technology is given, showing the advantages of a fabrication technology that is as flexible as silicon technology for the fabrication of /spl mu/TAS or "lab on a chip" devices. The following basic technology and control parameters will be highlighted. 1. Up to 100 /spl mu/m wide rectangular channels 2. Bosses and leak-free connections to external /spl mu/ fluidics. 3. Web-like structures for inlets/outlets>100 /spl mu/m. 4. Implementation of conductivity electrodes 5. Good thermal dissipation properties of the thin walls 6. Control of the electro osmotic flow by a radial voltage.
Keywords :
electrophoresis; etching; micropumps; osmosis; separation; /spl mu/channels; electro osmotic flow; electro osmotic pumping; electrophoretic separation; high voltage applications; miniaturized chemical separation devices; radial voltage; thermal dissipation; thin walls; transparent insulating channels; Building materials; Etching; Fabrication; Fluid flow control; Glass; Insulation; Semiconductivity; Semiconductor materials; Silicon on insulator technology; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
Type :
conf
DOI :
10.1109/IMNC.2000.872604
Filename :
872604
Link To Document :
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