Development of EUV reflectometer using a laser-plasma x-ray source

Summary form only given, as follows. In order to improve the performance of multilayer optics, it is necessary to use various measuring tools to evaluate their properties. Reflectometer is a principal measuring instrument among them. High performance reflectometers have been constructed in many synchrotron facilities. However, many researchers on multilayer optics cannot have ready access to such a reflectometer. Therefore, it is difficult to feed back the data obtained to the process for making multilayer optics. Then, we have developed a laboratory sized, readily useable and routinely operatable reflectometer using a laser-plasma x-ray source.