DocumentCode :
2472350
Title :
High-temperature superconducting oxide films
Author :
Hong, M. ; Kwo, J. ; Chen, C.H.
Author_Institution :
AT&T Bell Lab., Murray Hill, NJ, USA
fYear :
1988
fDate :
9-11 May 1988
Firstpage :
146
Lastpage :
151
Abstract :
Sputter deposition has been used with single-oxide targets and metal molecular beam epitaxy to prepare thin films of the high-T/sub c/ oxide Y-Ba-Cu-O superconductor. The processing parameters, the structural characteristics and the transport properties of the films are reported. The microstructures of superconducting Y/sub 1/Ba/sub 2/Cu/sub 3/O/sub 7/ thin films epitaxially grown on SrTiO/sub 3/
Keywords :
high-temperature superconductors; molecular beam epitaxial growth; sputter deposition; strontium compounds; substrates; yttrium compounds; MBE; SrTiO/sub 3/; YBa/sub 2/Cu/sub 3/O/sub 7/-SrTiO/sub 3/; density of twin boundaries; high critical current density; high temperature superconducting films; metal molecular beam epitaxy; microstructures; processing parameters; sputter deposition; structural characteristics; thin-film samples; transport properties; Critical current density; High temperature superconductors; Microstructure; Molecular beam epitaxial growth; Sputtering; Substrates; Superconducting epitaxial layers; Superconducting films; Superconducting thin films; Yttrium barium copper oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Components Conference, 1988., Proceedings of the 38th
Conference_Location :
Los Angeles, CA, USA
Type :
conf
DOI :
10.1109/ECC.1988.12586
Filename :
12586
Link To Document :
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