Characterization of TiO2 Thin Film Deposited by RF Sputtering Method

Author

Tiwary, R. ; Vyas, S. ; Shubham, K. ; Chakrabarti, P.

Author_Institution

Electron. & Commun. Dept., Motilal Nehru Nat. Inst. of Technol., Allahabad, India

fYear

2014

fDate

12-13 Sept. 2014

Firstpage

1

Lastpage

3

Abstract

The present work involves the study of crystalline structure and surface morphology of Titanium Dioxide (TiO₂) thin film deposited by RF magnetron sputtering. TiO₂ thin film was grown on ITO coated glass substrate using Ti metal target. The XRD results revealed the crystalline structure and indicated that the deposited film had the intensities of metastable anatase phase. The surface morphology and its roughness values suggest that the film had smooth surface and densely packed with grains.

Keywords

X-ray diffraction; coatings; semiconductor growth; semiconductor materials; semiconductor thin films; sputter deposition; surface morphology; surface roughness; titanium compounds; ITO; ITO coated glass substrate; RF sputtering method; Ti metal target; TiO₂; XRD; crystalline structure; metastable anatase phase; surface morphology; surface roughness; titanium dioxide thin film; Films; Glass; Indium tin oxide; Metals; Sputtering; Surface morphology; Surface treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

Devices, Circuits and Communications (ICDCCom), 2014 International Conference on

Conference_Location

Ranchi

Type

conf

DOI

10.1109/ICDCCom.2014.7024703

Filename

7024703