DocumentCode :
2472384
Title :
Influence of CARS process in silicon Raman laser
Author :
Huang, Ying ; Tang, Ming ; Shum, Ping ; Lin, Chinlon
Author_Institution :
Dept. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
fYear :
2009
fDate :
9-11 Sept. 2009
Firstpage :
113
Lastpage :
115
Abstract :
We investigated the coherent anti-Stokes Raman scattering (CARS) process in silicon Raman laser through a two-model approach. Significant output enhancement and threshold reduction could be obtained simultaneously with a phase-matched silicon waveguide cavity. End-facet reflectivity analysis is also explored to obtain output maximization configuration.
Keywords :
Raman lasers; coherent antiStokes Raman scattering; elemental semiconductors; laser cavity resonators; optical phase matching; optimisation; reflectivity; semiconductor device models; semiconductor lasers; silicon; waveguide lasers; CARS process; Si; coherent anti-Stokes Raman scattering; end-facet reflectivity analysis; output enhancement; output maximization configuration; phase-matched silicon waveguide cavity; silicon Raman laser; threshold reduction; two-model approach; Fiber lasers; Laser excitation; Laser modes; Laser tuning; Pump lasers; Raman scattering; Reflectivity; Silicon; Stimulated emission; Waveguide lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on
Conference_Location :
San Francisco, CA
ISSN :
1949-2081
Print_ISBN :
978-1-4244-4402-1
Electronic_ISBN :
1949-2081
Type :
conf
DOI :
10.1109/GROUP4.2009.5338339
Filename :
5338339
Link To Document :
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