Title :
A new cleaning technique for x-ray masks in alkaline solutions by control of surface potential
Author :
Tuda, Mutumi ; Kinugawa, Masaru ; Ootera, Hiroki ; Marumoto, Kenji
Author_Institution :
Adv. Technol. R&D Center, Mitsubishi Electr. Corp., Hyogo, Japan
Abstract :
This paper presents an electrochemical surface cleaning (ECSC) technique for x-ray masks employing amorphous WN/sub x/ absorbers. The electrostatic surface potential of the mask in alkaline solutions is precisely controlled for preventing from corrosion or etching of absorber films during cleaning, thus leading to almost no change in pattern dimension and film stress between before and after cleaning.
Keywords :
X-ray masks; surface cleaning; surface potential; tungsten compounds; WN; X-ray mask; alkaline solution; amorphous WN/sub x/ absorber; electrochemical surface cleaning; surface potential; Amorphous materials; Corrosion; Counting circuits; Electrodes; Etching; Stress; Substrates; Surface cleaning; Surface contamination; Tungsten;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
DOI :
10.1109/IMNC.2000.872619
