Dose uniformity of a compact beamline in routine operation with a storage ring "AURORA-2S"

Author

Hirose, S. ; Amano, D. ; Miyatake, T. ; Xan Li ; Hori, T.

Author_Institution

Res. & Dev. Center, Sumitomo Heavy Ind. Ltd., Tokyo, Japan

fYear

2000

fDate

11-13 July 2000

Firstpage

66

Lastpage

67

Abstract

In 1998, we developed a short beamline with high brightness for x-ray lithography. In 1999, the beamline which is installed in our Tanashi-plan has achieved a dose uniformity better than /spl plusmn/5 % with an exposure intensity over 60 mW/cm/sup 2/ using a synchrotron radiation (SR) beam from a storage ring "AURORA-2S (A2S)". In routine operation, the position of SR beam moves in a range of 0.15 mm in horizontal direction and 0.1 mm in vertical direction. The beam profile varies from round shape to oval shape with an operation parameter. In this paper, we describe the impact of both the beam profile and beam position stability on dose uniformity of the beamline.

Keywords

X-ray apparatus; X-ray lithography; storage rings; synchrotron radiation; AURORA-2S storage ring; Tanashi plan; X-ray lithography; beamline; brightness; dose uniformity; synchrotron radiation beam; Brightness; Charge measurement; Charge-coupled image sensors; Current measurement; Shape; Stability; Storage rings; Strontium; Synchrotron radiation; X-ray lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2000 International

Conference_Location

Tokyo, Japan

Print_ISBN

4-89114-004-6

Type

conf

DOI

10.1109/IMNC.2000.872625

Filename

872625