• DocumentCode
    2472880
  • Title

    Point injection in trench insulated gate bipolar transistor for ultra low losses

  • Author

    Antoniou, M. ; Udrea, F. ; Bauer, F. ; Mihaila, A. ; Nistor, I.

  • Author_Institution
    Dept. of Eng., Univ. of Cambridge, Cambridge, UK
  • fYear
    2012
  • fDate
    3-7 June 2012
  • Firstpage
    21
  • Lastpage
    24
  • Abstract
    In this paper we propose novel designs that enhance the plasma concentration across the Field Stop IGBT. The “p-ring” and the “point-injection” type devices exhibit increased cathode side conductivity modulation which results in impressive IGBT performance improvement. These designs are shown to be extremely effective in lowering the on-state losses without compromising the switching performance or the breakdown rating. For the same switching losses we can achieve more than 20% reduction of the on state energy losses compared to the conventional FS IGBT.
  • Keywords
    insulated gate bipolar transistors; losses; power semiconductor switches; cathode side conductivity modulation; field stop IGBT; p-ring type device; plasma concentration; point injection; point-injection type device; switching loss; trench insulated gate bipolar transistor; Anodes; Cathodes; Insulated gate bipolar transistors; Logic gates; Performance evaluation; Plasmas; Power semiconductor devices; Field Stop; Insulated Gate Bipolar Transistor; Point Injection; Soft Punch Through;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs (ISPSD), 2012 24th International Symposium on
  • Conference_Location
    Bruges
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4577-1594-5
  • Electronic_ISBN
    1943-653X
  • Type

    conf

  • DOI
    10.1109/ISPSD.2012.6229013
  • Filename
    6229013