Title :
Prediction of resist non-uniformity caused by underlying pattern density and topology
Author :
Kim, Jin-Young ; Son, Dong-Su ; Seo, Eun-Jung ; Soh, Young-Soo ; Bak, Heung-Jin ; Oh, Hye-Keun
Author_Institution :
Hanyang Univ., Ansan, South Korea
Abstract :
We developed a simulator that can predict spin coated resist thickness with different feature type, density and topology by using dimensionless parameter and liquid resist film thickness. The change of critical dimension with surrounding topology and pattern density is simulated for the non-uniform resist thickness.
Keywords :
photoresists; semiconductor process modelling; spin coating; critical dimension; dimensionless parameter; liquid film; lithography process simulation; pattern density; resist thickness nonuniformity; spin coating; substrate topology; Coatings; Lithography; Navier-Stokes equations; Planarization; Resists; Semiconductor device modeling; Thickness control; Topology; Transistors; Ultra large scale integration;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
DOI :
10.1109/IMNC.2000.872641
