Title :
Technology and performance of X-ray stepper for volume production
Author :
Mizusawa, N. ; Uda, K. ; Tanaka, Y. ; Ohta, H. ; Watanabe, Y.
Author_Institution :
Nanotechnol. & Adv. Syst. Labs., Canon Inc., Tochigi, Japan
Abstract :
Proximity X-ray lithography (PXL) has finished the demonstration stage of device fabrication and has started to be applied for volume production. We started the development of X-ray lithography tool in the middle of 1980´s, and in 1992 we have installed our prototype machine in the SR facility of Mitsubishi Electric Corporation (MELCO) and we have evaluated the machine in collaboration with MELCO. In the collaboration study, we have confirmed the system concept of X-ray stepper and clarified subjects for volume production tool development.
Keywords :
X-ray lithography; proximity effect (lithography); SR facility; X-ray stepper; expected performance; next generation lithography; prototype machine; proximity X-ray lithography; system concept; tool development; volume production; Biomembranes; Collaborative tools; Fabrication; Nanotechnology; Production; Prototypes; Strontium; Throughput; X-ray imaging; X-ray lithography;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
DOI :
10.1109/IMNC.2000.872646
