Fundamental study of "matrix pattern imaging", EB system

A new approach of electron beam lithography is proposed for high-throughput exposure systems. In an exposure system using this approach, the electron sources are arranged in a matrix so that they produce an electron beam in the shape of a circuit pattern, which is focused on the target. We call our approach "matrix pattern imaging (MPI)". In such a system, the electron sources play a key role, and the MIM (metal-insulator-metal) cathode is a promising candidate for them. We therefore compared its properties to those of other candidates. We also performed simple projection experiments and evaluated the merits of such a system.