DocumentCode :
2473362
Title :
Investigation of voltage-dependent thermal property in high-voltage drain-extended MOSFETs
Author :
Chen-Liang Chu ; Hu, C.M. ; Huang, C.F. ; Chen, Y.S. ; Chen, F.Y. ; Thei, K.B. ; Hsu, C.C. ; Yao, C.W. ; Liou, R.S. ; Tuan, H.C.
Author_Institution :
Analog / Power & Specialty Technol. Div., Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan
fYear :
2012
fDate :
3-7 June 2012
Firstpage :
117
Lastpage :
119
Abstract :
In this study, a reduction in the saturation current caused by self-heating effect at high VGS is observed in a 35-V rated asymmetric DEMOSFET. The high VGS -induced the large current and raises up the device surface temperature. The Kirk-effect takes places at sufficiently high current levels (high VGS values) leading to the movement of the maximum temperature point from the gate-overlapped DE (drain-extended) region to the drain-side contact region. The drift-region resistance strongly correlates to the self-heating effect and the VK voltage is proportional to the doping concentration in the drift region. As a result, the reduced surface heating (RESURH) can be realized by the optimization of doping concentration in the drift region.
Keywords :
MOSFET; semiconductor doping; RESURH; asymmetric DEMOSFET; doping concentration optimization; gate-overlapped DE region; gate-overlapped drain-extended region; high-voltage drain-extended MOSFET; maximum temperature point; reduced surface heating; self-heating effect; voltage 35 V; voltage-dependent thermal property; Degradation; Logic gates; MOSFETs; Surface resistance; Temperature distribution; DEMOSFET; thermal property; voltage-dependent;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs (ISPSD), 2012 24th International Symposium on
Conference_Location :
Bruges
ISSN :
1943-653X
Print_ISBN :
978-1-4577-1594-5
Electronic_ISBN :
1943-653X
Type :
conf
DOI :
10.1109/ISPSD.2012.6229037
Filename :
6229037
Link To Document :
بازگشت