DocumentCode
2473387
Title
CMOS compatible contacts and etching for InP-on-silicon active devices
Author
Grenouillet, Laurent ; Bavencove, A.L. ; Dupont, T. ; Harduin, J. ; Philippe, P. ; Regreny, P. ; Lelarge, F. ; Gilbert, K. ; Grosse, P. ; Fedeli, D.M.
Author_Institution
LETI, CEA, Grenoble, France
fYear
2009
fDate
9-11 Sept. 2009
Firstpage
196
Lastpage
198
Abstract
We present CMOS compatible dry etching and nonalloyed ohmic contacts on InP dice on silicon. These developments are validated through the demonstration of a continuous wave Ill-V/Si laser with etched facets and gold free contacts.
Keywords
III-V semiconductors; elemental semiconductors; etching; indium compounds; integrated optics; ohmic contacts; semiconductor lasers; silicon; CMOS compatible contacts; InP-Si; active devices; continuous wave laser; dice on silicon; dry etching; nonalloyed ohmic contacts; Dry etching; Gold; Hydrogen; III-V semiconductor materials; Indium phosphide; Microelectronics; Optical materials; Plasma applications; Silicon; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on
Conference_Location
San Francisco, CA
ISSN
1949-2081
Print_ISBN
978-1-4244-4402-1
Electronic_ISBN
1949-2081
Type
conf
DOI
10.1109/GROUP4.2009.5338397
Filename
5338397
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