DocumentCode
2473475
Title
Micromachining of optical fiber using reactive ion etching and its application
Author
Kumazaki, H. ; Yamada, Y. ; Oshima, T. ; Inaba, S. ; Hane, K.
Author_Institution
Dept. of Electr. Eng., Gifu Nat. Coll. of Technol., Japan
fYear
2000
fDate
11-13 July 2000
Firstpage
154
Lastpage
155
Abstract
If micromachining of an optical fiber with a three-dimensional structure could be performed, optical fibers would be more useful as devices with novel functions for communication instruments and sensors. The fabrication of a photon scanning tunnelling microscope (PSTM) fiber probe by wet chemical etching in a buffered hydrofluoric acid and micrometer-scale taps in a cladding by laser ablative chemical etching has been reported. However, a simple fabrication method for various configurations, such as lathe machining of optical fibers with high accuracy, has not been reported. For example, an optical fiber with some cladding in the middle region removed can be applied as a variable attenuator. In the case, the quantity of outgoing evanescent waves from the optical fiber depends on the type of material (or its position) surrounding the region from which the cladding has been removed. In this paper, micromachining of an optical fiber by reactive ion etching (RIE) and its application are discussed.
Keywords
micromachining; optical fibre fabrication; sputter etching; fabrication; micromachining; optical fiber; reactive ion etching; three-dimensional structure; Chemical lasers; Chemical sensors; Instruments; Micromachining; Optical device fabrication; Optical fiber sensors; Optical fibers; Optical sensors; Optoelectronic and photonic sensors; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-004-6
Type
conf
DOI
10.1109/IMNC.2000.872672
Filename
872672
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