DocumentCode :
2473808
Title :
Silicon oxynitride in integrated optics
Author :
Wörhoff, Kerstin ; De Ridder, René M. ; Lambeck, Paul V. ; Driessen, Alfred
Author_Institution :
MESA Res. Inst., Twente Univ., Enschede, Netherlands
Volume :
2
fYear :
1998
fDate :
3-4 Dec 1998
Firstpage :
370
Abstract :
A review on the state of the art of silicon oxynitride deposition at the MESA Research Institute will be given. The recent progress in the application of silicon oxynitride in communication devices will be discussed
Keywords :
integrated optics; optical communication equipment; optical fabrication; silicon compounds; MESA Research Institute; communication devices; integrated optics; silicon oxynitride; silicon oxynitride deposition; state of the art; Chemical vapor deposition; Integrated optics; Optical fiber devices; Optical fiber losses; Optical fiber polarization; Optical waveguides; Plasma chemistry; Plasma temperature; Refractive index; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1998. LEOS '98. IEEE
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-4947-4
Type :
conf
DOI :
10.1109/LEOS.1998.739716
Filename :
739716
Link To Document :
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