• DocumentCode
    2473996
  • Title

    Relative domination between Cl/sup +/ and Cl2/sup +/ ions in time-modulated inductively coupled Cl2 plasma investigated with laser-induced fluorescence technique

  • Author

    Kumagai, S. ; Sasaki, M. ; Koyanagi, M. ; Hane, K.

  • Author_Institution
    Dept. of Mech. & Precision Eng., Tohoku Univ., Sendai, Japan
  • fYear
    2000
  • fDate
    11-13 July 2000
  • Firstpage
    202
  • Lastpage
    203
  • Abstract
    Time-modulated plasma etching has been newly applied to the etching of semiconductor devices. In this etching technique, the electron temperature is lowered by cutting-off plasma discharge periodically. In this study, we simultaneously measure the relative densities of Cl/sub 2//sup +/ and metastable chlorine atomic ions Cl/sup +*/ in the time-modulated ICP and CW plasma by laser-induced fluorescence (LIF) technique and discuss their relative importance in the positive ions.
  • Keywords
    fluorescence; plasma density; sputter etching; Cl/sub 2/; electron temperature; ion density; laser-induced fluorescence; plasma etching; semiconductor processing; time-modulated inductively coupled plasma; Atomic measurements; Density measurement; Electrons; Etching; Plasma applications; Plasma density; Plasma devices; Plasma measurements; Plasma temperature; Semiconductor devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2000 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-004-6
  • Type

    conf

  • DOI
    10.1109/IMNC.2000.872709
  • Filename
    872709
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2473996