Title :
Relative domination between Cl/sup +/ and Cl2/sup +/ ions in time-modulated inductively coupled Cl2 plasma investigated with laser-induced fluorescence technique
Author :
Kumagai, S. ; Sasaki, M. ; Koyanagi, M. ; Hane, K.
Author_Institution :
Dept. of Mech. & Precision Eng., Tohoku Univ., Sendai, Japan
Abstract :
Time-modulated plasma etching has been newly applied to the etching of semiconductor devices. In this etching technique, the electron temperature is lowered by cutting-off plasma discharge periodically. In this study, we simultaneously measure the relative densities of Cl/sub 2//sup +/ and metastable chlorine atomic ions Cl/sup +*/ in the time-modulated ICP and CW plasma by laser-induced fluorescence (LIF) technique and discuss their relative importance in the positive ions.
Keywords :
fluorescence; plasma density; sputter etching; Cl/sub 2/; electron temperature; ion density; laser-induced fluorescence; plasma etching; semiconductor processing; time-modulated inductively coupled plasma; Atomic measurements; Density measurement; Electrons; Etching; Plasma applications; Plasma density; Plasma devices; Plasma measurements; Plasma temperature; Semiconductor devices;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
DOI :
10.1109/IMNC.2000.872709
