DocumentCode :
2474102
Title :
Vertical leakage/breakdown mechanisms in AlGaN/GaN-on-Si structures
Author :
Zhou, Chunhua ; Jiang, Qimeng ; Huang, Sen ; Chen, Kevin J.
Author_Institution :
Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Hong Kong, China
fYear :
2012
fDate :
3-7 June 2012
Firstpage :
245
Lastpage :
248
Abstract :
In this paper, we studied the vertical leakage/breakdown mechanisms in AlGaN/GaN structures grown on low resistivity p-type (111) Si substrate by temperature-dependent current-voltage measurements. We suggested that the top-to-substrate vertical leakage/breakdown is dominated by the space-charge-limited current (SCLC) conduction mechanism involving both acceptor and donor traps in buffer/transition layer. Based on temperature-dependent transient backgating measurements, the acceptor level and donor level were determined to be at EV+543 meV and EC-616 meV, respectively.
Keywords :
semiconductor devices; space charge; substrates; AlGaN-GaN; acceptor level; acceptor traps; buffer/transition layer; donor level; donor traps; silicon substrate; space charge limited current conduction mechanism; temperature-dependent current-voltage measurement; temperature-dependent transient backgating measurement; top-to-substrate vertical leakage/breakdown mechanism; Aluminum gallium nitride; Electric breakdown; Electron traps; Gallium nitride; Silicon; Substrates; Temperature measurement; AlGaN/GaN-on-Si structures; acceptor level; donor level; space-charge-limited current conduction; vertical leakage and breakdown;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs (ISPSD), 2012 24th International Symposium on
Conference_Location :
Bruges
ISSN :
1943-653X
Print_ISBN :
978-1-4577-1594-5
Electronic_ISBN :
1943-653X
Type :
conf
DOI :
10.1109/ISPSD.2012.6229069
Filename :
6229069
Link To Document :
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