DocumentCode :
2474190
Title :
New passivation of GaAs Schottky contact using sulfidation and hydrogenation
Author :
Kang, Min-Gu ; Kim, Ji-Wan ; Park, Hyung-Ho
Author_Institution :
Dept. of Ceramic Eng., Yonsei Univ., Seoul, South Korea
fYear :
2000
fDate :
11-13 July 2000
Firstpage :
220
Lastpage :
221
Abstract :
We report a novel method that can improve the Schottky property of Au/GaAs contact. The passivation technology was designed to control the defective states originated from two kinds of situations: i) air oxidation of GaAs surface before Schottky metallization, and ii) interfacial reaction during the metallization. In carefully controlled condition, the excellent Schottky contact was realized by sulfidation of GaAs surface and H-plasma treatment of Au/S-passivated GaAs interface.
Keywords :
III-V semiconductors; Schottky barriers; gallium arsenide; gold; hydrogenation; metallisation; passivation; semiconductor-metal boundaries; Au-GaAs; Au/GaAs Schottky contact; air oxidation; defective states; hydrogenation; interfacial reaction; metallization; passivation; plasma treatment; sulfidation; Bonding; Cleaning; Gallium arsenide; Gold; Hydrogen; Passivation; Plasmas; Protection; Schottky barriers; Schottky diodes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
Type :
conf
DOI :
10.1109/IMNC.2000.872722
Filename :
872722
Link To Document :
بازگشت