DocumentCode
2474265
Title
Development of high-reliability thick Al-Mg2 Si wire bonds for high-power modules
Author
Fujii, Yoshitaka ; Ishikawa, Yoshiki ; Takeguchi, Shunsuke ; Onuki, Jin
Author_Institution
Tech. Eng. Dept., Nippon Piston Ring Co., Ltd., Nogi, Japan
fYear
2012
fDate
3-7 June 2012
Firstpage
279
Lastpage
282
Abstract
Durability of IGBT modules mainly depends on reliability of the thick Al wire bonds used in them. We investigated the reliability of thick Al-0.5mass%Mg2Si wire bonds in comparison with conventional Al-50ppm Ni wire bonds. The shear strength of both Al-0.5mass%Mg2Si and Al-50ppmNi wire bonds were measured as a function of the number of thermal cycle tests. The strength ratio of Al-50ppmNi wire bonds decreased substantially with the number of cycles and it was 78.8% of the original strength after 10,000 cycles. On the other hand, that of Al-0.5mass%Mg2Si wire bonds was almost unchanged after 10,000 cycles. Degradation ratios of Al-0.5mass%Mg2Si and Al-50ppm Ni wire bonds at 10,000 cycles were about 1.6% and 21.2%, respectively; thus reliability of the former was ten times larger than that for the latter.
Keywords
insulated gate bipolar transistors; semiconductor device reliability; Al-Mg2Si; IGBT modules; high-power modules; high-reliability thick wire bonds; thermal cycle tests; Aging; Bonding; Films; Insulated gate bipolar transistors; Reliability; Silicon; Wires; IGBT module; thick Al wire bonds;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and ICs (ISPSD), 2012 24th International Symposium on
Conference_Location
Bruges
ISSN
1943-653X
Print_ISBN
978-1-4577-1594-5
Electronic_ISBN
1943-653X
Type
conf
DOI
10.1109/ISPSD.2012.6229077
Filename
6229077
Link To Document