DocumentCode
2474630
Title
Status of EUV lithography and plans in USA
Author
Gwyn, C.
Author_Institution
EUV LLC, Livermore, CA, USA
fYear
2000
fDate
11-13 July 2000
Firstpage
260
Lastpage
261
Abstract
The major EUV lithography development program in the US is supported by the EUV LLC consortium composed of Advanced Micro Devices, Intel, Micron, and Motorola. The program goal is to facilitate the research, development and engineering to enable the Semiconductor Equipment Manufacturers (SEMs) to provide production quantities of 70 nm EUV lithography tools for IC manufacturing by 2005.
Keywords
ultraviolet lithography; EUV lithography; IC manufacturing; LLC consortium; USA; semiconductor equipment manufacturers; Defense industry; Laboratories; Lithography; Metrology; Nonhomogeneous media; Optical sensors; Power engineering and energy; Production; Semiconductor device manufacture; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-004-6
Type
conf
DOI
10.1109/IMNC.2000.872747
Filename
872747
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