• DocumentCode
    2474949
  • Title

    Aluminum quantum dots fabrication by nano-imprint lithography

  • Author

    Hirai, Yoshihiko ; Yoshida, Satoshi ; Okuno, Hiroyuki ; Fujiwara, Masaki ; Tanaka, Yoshio

  • Author_Institution
    Dept. of Mech. Syst. Eng., Osaka Prefecture Univ., Japan
  • fYear
    2000
  • fDate
    11-13 July 2000
  • Firstpage
    292
  • Lastpage
    293
  • Abstract
    We have demonstrated the fabrication of Aluminum quantum dots by nano imprint lithography using dimpled mold. We believe that the fabricated structure would be a first step to realize mass production of an ultra large scaled quantum dots memory.
  • Keywords
    aluminium; lithography; moulding; nanotechnology; quantum dots; Al; aluminum quantum dot; dimpled mold; fabrication; nano-imprint lithography; Aluminum; Etching; Fabrication; Lithography; Logic arrays; Quantum dots; Resists; Single electron devices; Substrates; US Department of Transportation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2000 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-004-6
  • Type

    conf

  • DOI
    10.1109/IMNC.2000.872769
  • Filename
    872769
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2474949