Title :
Imprinting characteristics by photo-induced solidification of liquid polymer
Author :
Komuro, M. ; Taniguchi, J. ; Tokano, Y. ; Inoue, S. ; Kimura, N. ; Hiroshima, H. ; Matsui, S.
Author_Institution :
Electrotech. Lab., Japan
Abstract :
Imprinting lithography is the most promising technology in terms of mass-production and low-cost of equipment, but thermal cycle above the glass transition temperature (more than 100/spl deg/C) will worsen positional accuracy in stitching and overlay of patterns. In this paper, we describe the imprinting process using liquid polymer, which is solidified with Ultra-violet (UV) light exposure.
Keywords :
lithography; polymers; solidification; ultraviolet radiation effects; imprinting lithography; liquid polymer; photo-induced solidification; ultraviolet light exposure; Etching; Glass; Heating; Large scale integration; Lithography; Polymer films; Resists; Silicon; Temperature; Thermal resistance;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
DOI :
10.1109/IMNC.2000.872771
