Title :
The performances of the novel nozzle-scan coating method
Author :
Ito, S. ; Ema, T. ; Sho, K. ; Okumura, K. ; Kitano, T. ; Esaki, Y. ; Morikawa, M. ; Takeshita, K. ; Akimoto, M.
Author_Institution :
Process & Manuf. Eng. Center, Toshiba Corp., Yokohama, Japan
Abstract :
A novel nozzle-scan coating (NS-coating) method is useful for reducing the coated volume and its cost. We define the (waste-fluid rate) WFR as the ratio of the waste fluid to the fluid supplied on the wafer. In conventional spin-coating, the WFR is about 1500%. In the case of the extrusion-spin coating, the WFR decreases to 203%. But using the NS-coating with low speed and large acceleration, the WFR of the raw materials drastically decreased to 30%. This paper introduces some lithographic performances of NS-coating film of KrF chemical amplified resist that was coated with low WFR condition.
Keywords :
nozzles; photoresists; spin coating; KrF lithography; chemical amplified resist; nozzle-scan coating; spin coating; waste fluid rate; Acceleration; Chemicals; Coatings; Electrons; Indium tin oxide; Manufacturing processes; Raw materials; Research and development; Resists; Solvents;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
DOI :
10.1109/IMNC.2000.872774
