DocumentCode
2475244
Title
Negative ion motion in mixtures of CH4 and Ar with low SF6 content
Author
de Urquijo, J. ; Yousif, F.B.
Author_Institution
Fac. de Ciencias, Univ. Autonoma del Estado de Morelos, Cuernavaca, Mexico
fYear
2002
fDate
2002
Firstpage
690
Lastpage
693
Abstract
This paper deals with the measurement of the mobility of negative ions in the mixture SF6-CH4-Ar, with SF6 contents of up to 50%. The Pulsed Townsend Technique was used to produce electronic and ionic avalanches over the low E/N range in which ionization is either negligible or absent, and attachment processes are significant. The E/N range of measurement was 1 to 100 Td. The structure of the measured signals strongly suggests that there is only one negative ion, most likely formed by resonant attachment. A test of the measured mobilities with Blanc´s law provides further support to ascribe the drifting species to SF6-.
Keywords
Townsend discharge; argon; electron attachment; electron avalanches; gas mixtures; ion mobility; negative ions; organic compounds; sulphur compounds; Ar; Blanc law; SF6; SF6-CH4-Ar mixture; electronic avalanche; ionic avalanche; methane; negative ion mobility; pulsed Townsend technique; resonant attachment; Aluminum; Anodes; Capacitance; Cathodes; Copper; Electrodes; Electron mobility; Impedance; Ionization; Sulfur hexafluoride;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical Insulation and Dielectric Phenomena, 2002 Annual Report Conference on
Print_ISBN
0-7803-7502-5
Type
conf
DOI
10.1109/CEIDP.2002.1048890
Filename
1048890
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