• DocumentCode
    2475244
  • Title

    Negative ion motion in mixtures of CH4 and Ar with low SF6 content

  • Author

    de Urquijo, J. ; Yousif, F.B.

  • Author_Institution
    Fac. de Ciencias, Univ. Autonoma del Estado de Morelos, Cuernavaca, Mexico
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    690
  • Lastpage
    693
  • Abstract
    This paper deals with the measurement of the mobility of negative ions in the mixture SF6-CH4-Ar, with SF6 contents of up to 50%. The Pulsed Townsend Technique was used to produce electronic and ionic avalanches over the low E/N range in which ionization is either negligible or absent, and attachment processes are significant. The E/N range of measurement was 1 to 100 Td. The structure of the measured signals strongly suggests that there is only one negative ion, most likely formed by resonant attachment. A test of the measured mobilities with Blanc´s law provides further support to ascribe the drifting species to SF6-.
  • Keywords
    Townsend discharge; argon; electron attachment; electron avalanches; gas mixtures; ion mobility; negative ions; organic compounds; sulphur compounds; Ar; Blanc law; SF6; SF6-CH4-Ar mixture; electronic avalanche; ionic avalanche; methane; negative ion mobility; pulsed Townsend technique; resonant attachment; Aluminum; Anodes; Capacitance; Cathodes; Copper; Electrodes; Electron mobility; Impedance; Ionization; Sulfur hexafluoride;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulation and Dielectric Phenomena, 2002 Annual Report Conference on
  • Print_ISBN
    0-7803-7502-5
  • Type

    conf

  • DOI
    10.1109/CEIDP.2002.1048890
  • Filename
    1048890