Title :
Negative ion motion in mixtures of CH4 and Ar with low SF6 content
Author :
de Urquijo, J. ; Yousif, F.B.
Author_Institution :
Fac. de Ciencias, Univ. Autonoma del Estado de Morelos, Cuernavaca, Mexico
Abstract :
This paper deals with the measurement of the mobility of negative ions in the mixture SF6-CH4-Ar, with SF6 contents of up to 50%. The Pulsed Townsend Technique was used to produce electronic and ionic avalanches over the low E/N range in which ionization is either negligible or absent, and attachment processes are significant. The E/N range of measurement was 1 to 100 Td. The structure of the measured signals strongly suggests that there is only one negative ion, most likely formed by resonant attachment. A test of the measured mobilities with Blanc´s law provides further support to ascribe the drifting species to SF6-.
Keywords :
Townsend discharge; argon; electron attachment; electron avalanches; gas mixtures; ion mobility; negative ions; organic compounds; sulphur compounds; Ar; Blanc law; SF6; SF6-CH4-Ar mixture; electronic avalanche; ionic avalanche; methane; negative ion mobility; pulsed Townsend technique; resonant attachment; Aluminum; Anodes; Capacitance; Cathodes; Copper; Electrodes; Electron mobility; Impedance; Ionization; Sulfur hexafluoride;
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 2002 Annual Report Conference on
Print_ISBN :
0-7803-7502-5
DOI :
10.1109/CEIDP.2002.1048890