DocumentCode :
2475313
Title :
The effect of monomer structure in styrene polymers on the resistance towards PD in air
Author :
Gustafsson, Anders ; Gedde, Ulf W.
fYear :
1993
fDate :
17-20 Oct 1993
Firstpage :
462
Lastpage :
467
Abstract :
Styrene polymers were used to study the influence of chemical structure on resistance to PD (partial discharges). It was found that the monomer structure has a great influence on the PD stability. The behavior can be explained by the ease with which radicals are formed. The driving force for the formation of radicals during the degradation is enhanced by electron-donating substituents by the stabilization of benzylic type radicals. Copolymerization of styrene with p-phenylstyrene and 2-vinylnaphthalene (1-20 wt%) produced polymers with higher PD-stability than PS. This demonstrates that the size of the aromatic system is a positive factor regarding PD resistance and that typical voltage stabilizers may also be effective when they are chemically bonded to the main chain
Keywords :
free radical reactions; organic insulating materials; partial discharges; polymer structure; polymerisation; 2-vinylnaphthalene; PD; PD stability; benzylic type radicals; chemical structure; copolymerisation; electron-donating substituents; monomer structure; p-phenylstyrene; partial discharges; polystyrene; radicals; styrene polymers; voltage stabilizers; Electric breakdown; Electrons; Insulation; Needles; Partial discharges; Polymers; Rough surfaces; Testing; Thermal degradation; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 1993. Annual Report., Conference on
Conference_Location :
Pocono Manor, PA
Print_ISBN :
0-7803-0966-9
Type :
conf
DOI :
10.1109/CEIDP.1993.378929
Filename :
378929
Link To Document :
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