The effect of monomer structure in styrene polymers on the resistance towards PD in air

Author

Gustafsson, Anders ; Gedde, Ulf W.

fYear

1993

fDate

17-20 Oct 1993

Firstpage

462

Lastpage

467

Abstract

Styrene polymers were used to study the influence of chemical structure on resistance to PD (partial discharges). It was found that the monomer structure has a great influence on the PD stability. The behavior can be explained by the ease with which radicals are formed. The driving force for the formation of radicals during the degradation is enhanced by electron-donating substituents by the stabilization of benzylic type radicals. Copolymerization of styrene with p-phenylstyrene and 2-vinylnaphthalene (1-20 wt%) produced polymers with higher PD-stability than PS. This demonstrates that the size of the aromatic system is a positive factor regarding PD resistance and that typical voltage stabilizers may also be effective when they are chemically bonded to the main chain

Keywords

free radical reactions; organic insulating materials; partial discharges; polymer structure; polymerisation; 2-vinylnaphthalene; PD; PD stability; benzylic type radicals; chemical structure; copolymerisation; electron-donating substituents; monomer structure; p-phenylstyrene; partial discharges; polystyrene; radicals; styrene polymers; voltage stabilizers; Electric breakdown; Electrons; Insulation; Needles; Partial discharges; Polymers; Rough surfaces; Testing; Thermal degradation; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Electrical Insulation and Dielectric Phenomena, 1993. Annual Report., Conference on

Conference_Location

Pocono Manor, PA

Print_ISBN

0-7803-0966-9

Type

conf

DOI

10.1109/CEIDP.1993.378929

Filename

378929