• DocumentCode
    2475328
  • Title

    High field conduction in poly-p-xylylene thin film

  • Author

    Mizutani, T. ; Mori, T. ; Takai, Y. ; Ieda, U.

  • Author_Institution
    Dept. of Electr. Eng., Nagoya Univ., Japan
  • fYear
    1988
  • fDate
    5-8 June 1988
  • Firstpage
    154
  • Lastpage
    157
  • Abstract
    Poly-p-xylylene (PPX) films prepared by thermal chemical vapor deposition showed a negative temperature dependence of high-field current, dJ/dT<0, in the low-temperature region. The high-field current was accompanied by electroluminescence (EL). These results are explained in terms of collision ionization. In poly-2-chloro-p-xylyene (PCPX) films, which had a chlorine atom in a monomer unit, high-field current and EL were suppressed. Similar phenomena were observed on PPX films treated by an RF plasma. These films showed a higher breakdown strength than PPX films. It is concluded that chlorine atoms or defects introduced by the plasma treatment act as scattering centers and suppress the collision ionizations.<>
  • Keywords
    CVD coatings; electric breakdown of solids; electroluminescence; high field effects; impact ionisation; luminescence of organic solids; polymer films; RF plasma; breakdown strength; collision ionization; electroluminescence; high field conduction; high-field current; negative temperature dependence; poly-2-chloro-p-xylyene; poly-p-xylylene thin film; scattering centers; thermal chemical vapor deposition; Atomic layer deposition; Chemical vapor deposition; Electric breakdown; Electroluminescence; Ionization; Plasmas; Radio frequency; Scattering; Temperature dependence; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulation, 1988., Conference Record of the 1988 IEEE International Symposium on
  • Conference_Location
    Cambridge, MA, USA
  • ISSN
    1089-084X
  • Type

    conf

  • DOI
    10.1109/ELINSL.1988.13892
  • Filename
    13892