DocumentCode
2475408
Title
Relating digital imager defect rates to pixel size, sensor area and ISO
Author
Chapman, Glenn H. ; Thomas, Rohit ; Koren, Israel ; Koren, Zahava
Author_Institution
Sch. of Eng. Sci., Simon Fraser Univ., Burnaby, BC, Canada
fYear
2012
fDate
3-5 Oct. 2012
Firstpage
164
Lastpage
169
Abstract
Image sensors measurements show a continuous development of in-field permanent hot-pixel defects over time. We have accumulated experimental data on cameras with sensors ranging in size from large area (>;300 mm2) DSLRs (Digital Single-Lens Reflex cameras), medium sized (~40 mm2) Point and Shoot, and small (20 mm2) cell phone cameras. Our results show that the rate of defects depends on the technology (APS vs. CCD), and on design parameters such as imager area, pixel size (from 1.5 to 7 μm), and sensitivity (from ISO100 to 6400). Previous measurements showed that increased image sensitivity (ISO) enhances the defect appearance. Comparing different sensor sizes with similar pixel sizes showed that defect rates scale linearly with sensor area, suggesting the metric we call defect density measured by number of sensor defects/year/mm2. In an attempt to model this defect density as a function of both pixel size and ISO, we discovered a very good fit of the empirical densities to a power law in both the pixel size and the ISO, with slightly different parameters for CCD and APS (CMOS) sensors. Including the ISO in the equation allows us to predict the expected defect development rate for a wide set of sensor parameters. The power laws that we obtained show that defect densities are lower for CMOS pixels when pixel sizes are large (near 7 μm), but become higher than for CCDs at about 2 microns even for modest ISOs (near 400).
Keywords
CCD image sensors; CMOS image sensors; ISO standards; smart phones; APS; CCD; CMOS image sensor; ISO; cell phone camera; defect appearance enhancement; defect density measurement; digital imager defect rate; image sensitivity; in-field permanent hot pixel defect; pixel size; power law; sensor area; Decision support systems; Discrete Fourier transforms; Fault tolerance; Fault tolerant systems; ISO standards; Nanotechnology; Very large scale integration; CCD; ISO; active pixel sensor APS; defect detection; empirical defect rate equation; hot pixel; imager defect rates;
fLanguage
English
Publisher
ieee
Conference_Titel
Defect and Fault Tolerance in VLSI and Nanotechnology Systems (DFT), 2012 IEEE International Symposium on
Conference_Location
Austin, TX
Print_ISBN
978-1-4673-3043-5
Type
conf
DOI
10.1109/DFT.2012.6378218
Filename
6378218
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