• DocumentCode
    2475542
  • Title

    Design and fabrication of 2-DOF silicon micromirror with sloped electrodes

  • Author

    Jin, Joo-Young ; Park, Jae-Hyoung ; Yoo, Byung-Wook ; Jang, Yun-Ho ; Kim, Yong-Kweon

  • Author_Institution
    Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., Seoul, South Korea
  • fYear
    2009
  • fDate
    17-20 Aug. 2009
  • Firstpage
    135
  • Lastpage
    136
  • Abstract
    We report on the design, fabrication and experiment of a 2-DOF silicon scanning micromirror. We propose sloped electrodes to increase a maximum scan angle with a simple fabrication process. A delayed electroplating technique is adopted to fabricate the sloped profile of the electrodes over the patterned seed layer. We fabricated the 2-DOF scanning mirror which has different type of electrodes beneath each axis and compared with parallel plate electrodes. Experiment results show sloped electrodes increase stable range up to 62.1% and decreases actuation voltage down to 65.4% from parallel plate electrodes.
  • Keywords
    electro-optical devices; electroplating; microfabrication; micromirrors; optical design techniques; optical fabrication; silicon; Si; delayed electroplating technique; microfabrication; patterned seed layer; silicon scanning micromirror design; sloped electrodes; Actuators; Analytical models; Delay; Electrodes; Fabrication; Micromirrors; Mirrors; Rotation measurement; Silicon; Voltage; cone-type; electroplating; scanning mirror; sloped electrode; wedge-type;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMS and Nanophotonics, 2009 IEEE/LEOS International Conference on
  • Conference_Location
    Clearwater, FL
  • Print_ISBN
    978-1-4244-2382-8
  • Electronic_ISBN
    978-1-4244-2382-8
  • Type

    conf

  • DOI
    10.1109/OMEMS.2009.5338542
  • Filename
    5338542