Title :
Liquid immersion angled exposure for 3D photolithography
Author :
Sasaki, Minoru ; Hosono, Takafumi ; Kumagai, Shinya
Author_Institution :
Dept. of Adv. Sci. & Technol., Toyota Technol. Inst., Nagoya, Japan
Abstract :
Photolithography on the sample surface with vertical side walls is studied. In the angled exposure for patterning side walls or bottoms, the reflection of the exposing light is necessary to be minimized for obtaining the defect-free pattern. The liquid immersion method is applied. With the polarization control, the optimum pattern is obtained using the single shot exposure.
Keywords :
photolithography; 3D photolithography; liquid immersion method; vertical side walls; Coatings; Degradation; Lithography; Optical films; Optical polarization; Optical reflection; Optical refraction; Reflectivity; Refractive index; Resists; 3D photolithography; Angled exposure; Liquid immersion; Vertical side wal;
Conference_Titel :
Optical MEMS and Nanophotonics, 2009 IEEE/LEOS International Conference on
Conference_Location :
Clearwater, FL
Print_ISBN :
978-1-4244-2382-8
Electronic_ISBN :
978-1-4244-2382-8
DOI :
10.1109/OMEMS.2009.5338590
