• DocumentCode
    2477970
  • Title

    Electrical characteristics of MIS capacitors with BST thin films deposited on n-Si(100) by the sol-gel method

  • Author

    Law, C.W. ; Tong, K.Y. ; Wong, K.L. ; Li, J.H. ; Kun Li

  • Author_Institution
    Dept. of Electron. Eng., Hong Kong Polytech., Kowloon, Hong Kong
  • fYear
    1998
  • fDate
    29-29 Aug. 1998
  • Firstpage
    54
  • Lastpage
    57
  • Abstract
    The application of high dielectric Sr 0.20Ba 0.8TiO 3 (BST) thin films for Metal-Insulator-Semiconductor (MIS) capacitors was investigated. BST thin films were deposited on n-Si(100) substrates by the sol-gel method. We examined the characteristics of the MIS capacitor at 30°C and 120°C. The hysteresis loop was determined by high frequency (1 MHz) capacitance-voltage (C-V) measurement. Also, current-voltage (I-V) characteristics of the MIS capacitor were investigated. The BST MIS structure showed a relatively high dielectric constant in the insulator. It was found that the small signal capacitance of the MIS capacitors was affected by the ferroelectric properties of the BST films. The I-V measurement revealed that the BST films obey Frenkel-Poole emission conduction process under high electric field.
  • Keywords
    MIS capacitors; Poole-Frenkel effect; barium compounds; dielectric hysteresis; ferroelectric capacitors; ferroelectric thin films; permittivity; sol-gel processing; strontium compounds; 1 MHz; 30 to 120 degC; Frenkel-Poole emission; MIS capacitors; Si; Sr/sub 0.20/Ba/sub 0.8/TiO/sub 3/; capacitance-voltage measurement; current-voltage characteristics; dielectric constant; ferroelectric properties; high electric field; hysteresis loop; n-Si(100) substrates; small signal capacitance; sol-gel method; thin films; Binary search trees; Capacitance-voltage characteristics; Capacitors; Dielectric measurements; Dielectric substrates; Dielectric thin films; Electric variables; Ferroelectric films; Sputtering; Strontium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1998. Proceedings. 1998 IEEE Hong Kong
  • Conference_Location
    Hong Kong
  • Print_ISBN
    0-7803-4932-6
  • Type

    conf

  • DOI
    10.1109/HKEDM.1998.740187
  • Filename
    740187