Title :
A simple and meaningful expression of heterojunction built-in voltage between p-type SiGe and n-type Si
Author :
Kong, Deyi ; Wei, Tongli ; Li, Yao ; Nie, Weidong ; Qian, Wensheng
Author_Institution :
Microelectron. Center, Southeast Univ., Nanjing, China
Abstract :
In this work, the heterojunction built-in voltage between n-type Si and strained p-type SiGe is derived from their energy band diagrams, a simple and meaningful quantitative expression is presented. For unstrained SiGe, it reduces to a more simple expression, say, it can be simply determined by the built-in voltage of Si homojunction and the bandgap narrowing of SiGe. The expression is convenient in calculation.
Keywords :
Ge-Si alloys; elemental semiconductors; energy gap; p-n heterojunctions; semiconductor materials; silicon; SiGe-Si; bandgap narrowing; energy band diagram; heterojunction built-in voltage; n-type Si; strained p-type SiGe; Capacitance; Frequency; Germanium silicon alloys; Heterojunctions; Microelectronics; Photonic band gap; Silicon germanium; Temperature; Voltage; Wideband;
Conference_Titel :
Electron Devices Meeting, 1998. Proceedings. 1998 IEEE Hong Kong
Conference_Location :
Hong Kong
Print_ISBN :
0-7803-4932-6
DOI :
10.1109/HKEDM.1998.740196