Title :
Variable Control Design and its Application to Wafer Scanners
Author :
Heertjes, Marcel ; van de Wouw, N.
Author_Institution :
Philips Appl. Technol., Eindhoven
Abstract :
A variable control design is presented. The validity of such a design in dealing with linear performance trade-offs is demonstrated on a reticle stage motion system of an industrial wafer scanner. Performance is achieved by continuously balancing stability margins over disturbance rejection properties. This is done by a nonlinear state-dependent element in the feedback loop. Apart from performance, design rules and conditions to guarantee stability of the nonlinear system are considered
Keywords :
Lyapunov methods; control system synthesis; feedback; nonlinear control systems; stability; Lurie-Postnikov form; Lyapunov stability; feedback loop; industrial wafer scanner; nonlinear control system; nonlinear state-dependent element; reticle stage motion system; stability margin; variable control design; variable gain; Control design; Control systems; Electrical equipment industry; Feedback; Gain; Industrial control; Nonlinear control systems; Optical variables control; Servomechanisms; Stability; Lurie-Postnikov form; Lyapunov stability; nonlinear control; stability margins; variable gains;
Conference_Titel :
Decision and Control, 2006 45th IEEE Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-0171-2
DOI :
10.1109/CDC.2006.377406
