DocumentCode :
2480086
Title :
Dopant level freeze-out in 6H-SiC Schottky diodes and junctions
Author :
Raynaud, C. ; Guillot, G.
Author_Institution :
Lab. de Physique de la Matiere, INSA de Lyon, Villeurbanne, France
fYear :
1996
fDate :
29 Apr-3 May 1996
Firstpage :
227
Lastpage :
230
Abstract :
Admittance spectroscopy is shown to be a very convenient tool for analysing majority carrier traps. We have studied by this technique different n- and p-type 6H-SiC Schottky diodes and pn junctions for different net doping levels, N-type and p-type doping are obtained by nitrogen and aluminum respectively, For nitrogen, we have detected two energy levels at Ec-82 meV and Ec-137 meV, which are respectively attributed to hexagonal and cubic sites in 6H-SiC. For aluminum, we have generally detected a rather large variation in the measured activation energy. This variation is supposed to depend on the net doping level, that is, on the compensation ratio
Keywords :
Schottky diodes; aluminium; impurity states; nitrogen; p-n junctions; semiconductor doping; semiconductor epitaxial layers; semiconductor materials; silicon compounds; wide band gap semiconductors; 6H-SiC; Schottky diodes; SiC:Al; SiC:N; activation energy; admittance spectroscopy; compensation ratio; dopant level freeze-out; doping level; majority carrier traps; n-type doping; p-type doping; pn junctions; Admittance; Aluminum; Doping; Energy measurement; Energy states; Light emitting diodes; Nitrogen; Schottky diodes; Silicon carbide; Spectroscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconducting and Semi-Insulating Materials Conference, 1996. IEEE
Conference_Location :
Toulouse
Print_ISBN :
0-7803-3179-6
Type :
conf
DOI :
10.1109/SIM.1996.571082
Filename :
571082
Link To Document :
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